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The Antares is an excellent beginners skate. Most dealers sell them pre-mounted. It’s a very comfortable boot, that won’t have a real break-in phase. It is suitable for all single jumps. Antares Audio Technologies. Makers of Auto-Tune. Antares is a leading developer of software for music recording and live performance. For over 20 years, Antares has powered the music of top-charting and indie artists with products including the industry standard for pitch correction, Auto-Tune™.
The lunging aids Easy Lunge has winning on December 2015 the Trophées de l’Innovation du Salon du Cheval de Paris (Innovation Trophy).
Designed and patented by Frédéric Brégetzer, and sold by Antarès. This lunging system gives the horse the freedom he needs to work thoroughly, without constraint or pressure. As a result, this system improves your horse’s movement, balance and topline. It is a user friendly system that requires no specific set ups.
Available on this website !
https://shop.antares-sellier.com/en/training-aids/95-elastic-breastplate.html
In 2015, Antarès has won the Emergence Price of Business Company – Positive Companies Trophy !
Rich Fellers and his faithful Flexible won the World Cup !
Philippe Le Jeune and Vigo d’Arsouille became world champions in showjumping in Lexington with an helmet and an Antarès saddle !
En 2008, Antarès est labellisée “Entreprises du patrimoine Vivant”.
L’atelier de Saintes en Charente-Maritime est composé de 35 artisans bourreliers, harnacheurs et artisans selliers. Ils mettent à votre service un savoir-faire ancestral. Leur expertise: la selle d’équitation sur mesure, en 5 étapes.
Jos Lansink et Cumano sont champions du monde de saut d’obstacles avec une selle Antarès.
Our partner Cédric Lyard is olympic champion with eventing French team during Athen Olympic Games with Fine Merveille.
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En 2003, Antarès reçoit le prix de la dynamique artisanale.
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ANTARES™ -Nano
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In addition to the classic ANTARES™ that has been used across multiple technology nodes in semiconductor fabs worldwide, TEL offers the new ANTARES™ – Nano which features a smaller aerosol size for improved removal efficiency in the smallest nanoparticle size range, plus improved capability for cleaning sensitive patterns without damage. Semiconductor manufacturers have advanced their technology through recent generations by introduction of various new materials, a trend which will continue for the foreseeable future. In many cases the materials have sensitivities which limit the applicability of historical wet clean processes for removing contaminants. Metals are easily corroded, hydrophobic films are prone to watermarks, and some materials such as Ge can be attacked by aqueous chemistries. Furthermore, even traditional materials such as Si and SiO2 frequently must be cleaned with near-zero material loss, due to tightened dimensional requirements. Therefore, this ANTARES™ -Nano presents cleaning methods that are safe for all materials and patterns are increasingly needed.
Performance comparison of ANTARES™ – Nano with low-etching wet SC1/spray process.
Surface LPD measurements showing 99% particle removal from hydrophobic ULK surface. Wet processing is not suitable for this film due to watermark defects.
k-value measurement showing no difference in k-value between ANTARES™ - Nano processed wafer and control wafer (no process).